Skywater fab adopts e-beam lithography

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Skywater, the US DoD-backed secure fab, is to use Multibeam’s Multicolumn Electron-Beam Lithography (MEBL) system in its 45 nm process. The new system was funded by a $38 million contract award from the DoD and program managed by the Air Force Research Lab. This “security lithography” technology is designed to pattern entire wafers at 45nm …

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